PROTECT YOUR PROCESS WITH THE HALO QRP

Modern semiconductor deposition processes—from low-temperature epitaxy to ALD and MOCVD—operate routinely at chamber pressures far below atmosphere and approach the single-digit torr range. At the same time, process temperatures are continuously decreasing. Under these conditions, residual moisture in the chamber poses a significant threat to process quality and production yields. 

Our TIGER OPTICS™ HALO™ QRP for Moisture Monitoring in Low Pressure Chambers is optimized to operate under these low-pressure conditions and deliver exact and reliable real-time measurement to verify moisture residue in, for example, the load lock, transfer and process chambers before H2O contaminants compromise the subsequent process step. Based on our proven Cavity Ring-Down Spectroscopy (CRDS) technology, the HALO QRP sets new standards in ease-of-use and measurement precision for this application and operates at chamber pressures as low as 1 Torr.

DESIGNED FOR TRACE LEVEL MOISTURE ANALYSIS IN LOW PRESSURE (<50 TORR) APPLICATIONS, THE HALO QRP OFFERS:

• Moisture detection at partial pressure of 1 µTorr and below
• Absolute accuracy and excellent precision
• Wide dynamic range—over four orders of magnitude
• Low cost of ownership and operational simplicity
• Clean technology—no external calibration gases required
• Compact analyzer footprint, also available as OEM module for equipment/system integration

DETECTION LIMIT AND SENSITIVITY IN CONCENTRATION UNITS (PPB)