HALO QRP
Modern semiconductor deposition processes—from low-temperature epitaxy to ALD and MOCVD—operate routinely at chamber pressures far below atmosphere and approach the single-digit torr range. At the same time, process temperatures are continuously decreasing. Under these conditions, residual moisture in the chamber poses a significant threat to process quality and production yields.
Our TIGER OPTICS™ HALO™ QRP for Moisture Monitoring in Low Pressure Chambers is optimized to operate under these low-pressure conditions and deliver exact and reliable real-time measurement to verify moisture residue in, for example, the load lock, transfer and process chambers before H2O contaminants compromise the subsequent process step. Based on our proven Cavity Ring-Down Spectroscopy (CRDS) technology, the HALO QRP sets new standards in ease-of-use and measurement precision for this application and operates at chamber pressures as low as 1 Torr.
Detection (Matrix independent) |
Range | LDL (peak-to-peak) | Sensitivity (3σ) |
---|---|---|---|
H2O | 0 – 12 mTorrpp (1200 ppm @ 10 Torr) |
1 μTorrpp (see chart for ppb units) |
0.5 μTorrpp (see chart for ppb units) |
Serani™ Analyzer Interface Software offers users a new way to access their analyzer remotely from any computer or laptop. Compatible with most HALO, Spark, Tiger-i, CO-rekt and ALOHA H2O series analyzers.
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