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Secondary Ion Mass Spectrometry (SIMS)


Secondary Ion Mass Spectrometry (SIMS) is used to detect and characterize trace elements at or near the surface of a solid or thin film allowing researchers to understand the chemical composition of the surface.   This surface science technique requires the use of systems with very high sensitivity and the ability to perform high resolution energy analysis. SIMS is useful for a wide variety of surface analysis. For example, SIMS can be used to detect and analyze contaminants on a surface, analyze materials and devices to ensure the quality of specific products, and study atomic scale defects that may occur in the manufacturing of semiconductor chips or other materials. 

Our EXTREL™ MAX-QMS™ Mass Spectrometer System has the performance and flexibility required for these applications. The MAX-QMS systems are the highest performance quadrupole analyzers available. Coupled with one of our high transmission Energy Filters, the MAX-QMS systems furnish the high performance necessary for high accuracy surface analysis and depth profiling. The system offers the best price to performance ratio. Flange mounted Mass Spectrometers manufactured by Extrel allow the user to add Static and Dynamic SIMS capabilities to existing systems.

SIMS Products include

  • Axial Energy Analyzer
  • Cross Beam Deflector Ionizer
  • MAX-QMS Flange Mounted Mass Spectrometers
  • Tandem Ionizer Energy Filter – reduces signal to noise ratio

Features of the MAX-QMS System

  • High sensitivity to 10 mA/Torr
  • Partial pressure detectability to 10-16 mbar
  • Energy resolution down to 0.5 eV
  • Various mass ranges from 1-60 to 2 t-2000 amu
  • Axial and right-angle configurations
  • Positive and negative ion detection


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