• Ppt-level analysis for CO, CO₂ and CH₄ impurities
• Continuous, real-time measurement
• High reliability, low maintenance
• Response time within seconds
• Low cost of ownership
• No calibration requirements
• No carrier gas requirements
• Easy to install, start up and use

• Airborne Molecular Contaminants
• High-Purity Gases & Systems
• Low-Temperature SixGey Epitaxy
• Atomic Layer Deposition (ALD)  
• MOCVD
• UHP Ammonia & High-Brightness LEDs
• Ultra-High-Purity Ammonia
• MOCVD

 HIGH-BRIGHTNESS LEDS

It is essential to monitor impurities in high-brightness LEDs because impurities can have a significant impact on their performance and longevity. LEDs are highly sensitive electronic devices that emit light when current flows through them. Impurities, such as moisture or oxygen, can interfere with this process, leading to reduced light output, decreased efficiency, and shortened lifespan of the LED.

For example, if moisture is present in the LED, it can cause corrosion and degradation of the metal contacts and the LED’s semiconductor material. This can result in decreased light output, increased heat generation, and ultimately, failure of the LED. Similarly, oxygen can react with the LED’s semiconductor material, creating defects that can reduce the LED’s efficiency and output.

By monitoring impurities in high-brightness LEDs, manufacturers can ensure that the LEDs meet their performance and longevity specifications. This can help to prevent defects and failures in the LEDs and increase their overall reliability. Additionally, monitoring impurities can help to identify any issues in the manufacturing process that may be introducing impurities into the LEDs, allowing for improvements to be made to ensure consistent high-quality LED production.

In the production of UHP ammonia, our TIGER OPTICS™ CRDS (Cavity Ring-Down Spectroscopy) Gas Analyzers are used to measure and monitor impurities such as moisture, oxygen, and nitrogen in the ammonia gas. Even small amounts of these impurities can affect the quality of the final product, so it is essential to ensure that the ammonia gas used in the production process is of high purity. The CRDS analyzer provides highly accurate and sensitive measurement of these impurities, allowing for real-time monitoring and control of the production process.

In the production of high-brightness LEDs, again our CRDS gas analyzers are used to measure and monitor impurities such as oxygen, moisture, and hydrocarbons in the process gases used to deposit the semiconductor layers on the LED substrate. These impurities can affect the electrical properties and reliability of the LED, so it is critical to ensure that the process gases are of high purity. The CRDS analyzer provides real-time and highly accurate measurement of these impurities, allowing for precise control of the deposition process.

CRDS (Cavity Ring-Down Spectroscopy) gas analyzers offer several benefits for LED (light-emitting diode) production processes. Some of the key benefits include:

• High Sensitivity: CRDS technology is highly sensitive and can detect trace amounts of impurities in gas streams, including water vapor and oxygen, which are critical contaminants that can affect the performance and lifespan of LEDs.
• Real-time Monitoring: Provide real-time data on gas purity, allowing for quick identification of process issues and adjustment of gas delivery systems to maintain optimal conditions.
• High Accuracy: Provides accurate measurements of gas impurities, with detection limits down to parts-per-trillion levels, ensuring the purity of gases used in LED production.
• Easy to Use: Are easy to install, operate, and maintain, with built-in calibration and verification features that simplify routine maintenance.
• Improves Yield and Quality: By using CRDS gas analyzers, LED manufacturers can improve process control, reduce yield losses, and ensure consistent product quality.
• Versatile: Can be used to monitor a wide range of gases, including high-purity process gases, bulk gases, and gas mixtures, making them a versatile tool for LED production processes.

PROCESS TOOLS

Semiconductor manufacturing requires a highly controlled environment with very low levels of impurities, as even small amounts of certain gases can cause defects in the final product. Therefore, real-time and accurate gas analysis is crucial in maintaining a stable and consistent manufacturing process.

Monitoring process controls in the semiconductor industry is crucial because the performance and reliability of semiconductor devices are highly dependent on the quality and consistency of the manufacturing process. Even small variations or deviations in the manufacturing process can lead to defects and failures in the final product, which can have significant implications for the functionality and safety of electronic devices that use these semiconductors.

By continuously monitoring process controls, semiconductor manufacturers can ensure that the manufacturing process is operating within the required specifications and tolerances, and any deviations are identified and corrected in real-time. This can help to minimize defects, reduce waste, and increase yield and productivity.

Our TIGER OPTICS™ CRDS (Cavity Ring-Down Spectroscopy) Gas Analyzers are used as a process tool for the semiconductor industry for several reasons:

• Trace Gas Detection: CRDS technology is highly sensitive and can detect trace amounts of impurities in gas streams, making it an ideal tool for monitoring and controlling gas purity in semiconductor manufacturing processes.
• Real-time Monitoring: Provide real-time data on gas purity, allowing for quick identification of process issues and adjustment of gas delivery systems to maintain optimal conditions.
• High Accuracy: Provides accurate measurements of gas impurities, with detection limits down to parts-per-trillion levels.
• Easy to Use: Are easy to install, operate, and maintain, with built-in calibration and verification features that simplify routine maintenance.
• Versatile: Can be used to monitor a wide range of gases, including high-purity process gases, bulk gases, and gas mixtures.
• Process Control: Can improve process control, reduce yield losses, and ensure consistent product quality.

wastewater monitoring

Wastewater generated during the semiconductor manufacturing process contains a variety of contaminants, including heavy metals, acids, solvents, and other chemicals. These contaminants can pose a threat to the environment if they are not properly treated before being discharged into the environment. Therefore, it’s important to monitor wastewater in the semiconductor manufacturing process for the following reasons:

• Environmental Compliance: Discharge of untreated or poorly treated wastewater into the environment can lead to environmental pollution, which can result in regulatory violations and penalties. By monitoring wastewater quality, semiconductor manufacturers can ensure that their wastewater discharge meets local and federal environmental regulations.
• Resource Conservation: Semiconductor manufacturing is a water-intensive process, and the industry has been under increasing pressure to reduce water consumption and minimize its environmental impact. By monitoring wastewater, semiconductor manufacturers can identify opportunities to recycle or reuse water, reducing the amount of freshwater consumption and the amount of wastewater generated.
• Cost Reduction: Wastewater treatment can be a significant cost for semiconductor manufacturers. By monitoring wastewater quality, manufacturers can optimize treatment processes, minimize treatment costs, and reduce the volume of wastewater that needs to be treated.
• Process Control: Monitoring wastewater can provide valuable insights into the semiconductor manufacturing process. Wastewater composition and quality can indicate problems with manufacturing processes or equipment, allowing manufacturers to take corrective action to improve process efficiency and product quality.

Our LAR™ QuickTOCultra™ water quality analyzer is used for the measurement of Total Organic Carbon (TOC) levels in semiconductor wastewater.   Here are the key features and benefits of the QuickTOCultra™ for this application:

• Measuring Organic Carbon Content: Uses the highly sensitive UV oxidation method to measure the total organic carbon (TOC) content of the wastewater. This allows for accurate and reliable monitoring of the organic content of the wastewater, which is a critical parameter in semiconductor manufacturing.
• Wide Detection Range: Has a wide detection range of 0-50,000 ppm, making it suitable for monitoring the organic carbon content of a wide range of semiconductor wastewater samples.
• Rapid Response Time: Has a rapid response time of just 3 minutes, allowing for real-time monitoring of wastewater quality.
• Low Maintenance:  Is a low-maintenance instrument, with no reagents or consumables required for operation. This makes it easy to use and reduces the cost of ownership.
• Automatic Cleaning: Features an automatic cleaning system that ensures reliable and accurate measurements over long periods of time.
• Remote Monitoring: Can be connected to a network for remote monitoring and control, allowing for convenient access to data and easy integration into a larger wastewater management system.

Ultra-pure water is a critical component in many semiconductor manufacturing processes. It is used in a wide range of applications, including cleaning, rinsing, etching, and photolithography, and any impurities in the water can have a significant impact on the quality and performance of the final product.

Here are some reasons why it’s important to monitor ultra-pure water in semiconductor manufacturing:

• Contamination Prevention: Ultra-pure water must be free from any impurities that can contaminate the semiconductor manufacturing process. This includes organic and inorganic compounds, particulates, and microorganisms. By continuously monitoring the quality of ultra-pure water, manufacturers can ensure that the water meets the required purity standards, preventing contamination and improving product quality.
• Equipment Protection: Ultra-pure water is often used in equipment such as boilers, heat exchangers, and high-pressure pumps. Any impurities in the water can lead to equipment corrosion, scaling, and fouling, reducing the efficiency and lifespan of the equipment. By monitoring the water quality, manufacturers can detect any impurities that may cause damage to the equipment and take corrective action.
• Yield Improvement: The presence of impurities in ultra-pure water can lead to defects in the semiconductor manufacturing process, resulting in reduced yield and increased costs. By monitoring the quality of ultra-pure water, manufacturers can identify and address any issues that may affect the manufacturing process, resulting in improved yield and reduced costs.
• Regulatory Compliance: The semiconductor industry is subject to various regulations and standards that require the use of ultra-pure water in specific manufacturing processes. By monitoring the quality of ultra-pure water, manufacturers can ensure compliance with these regulations and standards, avoiding any potential penalties and legal issues.

Our LAR™ QuickTOCtrace™ water quality analyzer is designed to monitor total organic carbon (TOC) levels in ultra-pure water. The analyzer uses a unique and highly sensitive technique known as ‘chemiluminescence’ to measure TOC levels in water samples.

Some of the benefits of using the QuickTOCtrace analyzer include:

• High Sensitivity: Uses chemiluminescence technology, which is highly sensitive and can detect TOC levels as low as 0.5 parts per billion (ppb).
• Fast Analysis: Can analyze water samples in as little as three minutes, providing real-time data to operators and minimizing downtime.
• Wide Range of Applications: Can be used to monitor ultra-pure water quality in a variety of industries, including semiconductor manufacturing, pharmaceuticals, and power generation.
• Minimal Maintenance: Designed to be easy to use and requires minimal maintenance, reducing the need for downtime and saving on labor costs.
• Compliance with Regulations: Can help companies comply with regulatory requirements for water quality monitoring and avoid potential fines or penalties.
• Early Detection of Contaminants: Detects organic contaminants in ultra-pure water early, allowing operators to take corrective action before the quality of the end product is compromised.

In the semiconductor manufacturing process, electronic gases are used for various purposes, such as depositing thin films, etching, cleaning, and purging. The quality and purity of these gases are critical for achieving the desired performance of the final semiconductor product.

Our TIGER OPTICS™ CRDS (Cavity Ring-Down Spectroscopy) Gas Analyzers are commonly used in the semiconductor industry to measure and monitor the concentration of various electronic gases used in the manufacturing process. These electronic gases include silane, ammonia, nitrogen trifluoride, hydrogen, and other gases.Our CRDS gas analyzers use laser spectroscopy to detect trace amounts of gases with high sensitivity and accuracy. They can measure a wide range of electronic gases, including impurities in these gases. The CRDS analyzer provides real-time and highly accurate measurement of these gases, allowing for precise control of the manufacturing process.

For example, in the deposition process of thin films, gas analyzers can measure the concentration of the precursor gases and any impurities in real-time. This information can be used to adjust the gas flow rates and deposition parameters to maintain the desired quality of the thin films.

In addition, during the etching process, gas analyzers can measure the concentration of the etchant gas and any by-products to ensure the proper removal of the material from the substrate.

Our CRDS (Cavity Ring-Down Spectroscopy) Gas Analyzers offer several benefits for monitoring electronic gases, including:

• High Sensitivity: CRDS technology is highly sensitive and can detect trace amounts of impurities in gas streams, making it an ideal tool for monitoring and controlling gas purity in electronic gas applications.
• Real-time Monitoring: Provide real-time data on gas purity, allowing for quick identification of process issues and adjustment of gas delivery systems to maintain optimal conditions.
• High Accuracy: Provides accurate measurements of gas impurities, with detection limits down to parts-per-trillion levels, ensuring the purity of gases used in electronic gas applications.
• Easy to Use: Are easy to install, operate, and maintain, with built-in calibration and verification features that simplify routine maintenance.
• Versatile: Can be used to monitor a wide range of electronic gases, including high-purity process gases, bulk gases, and gas mixtures.
• Process Control: Can improve process control, reduce yield losses, and ensure consistent product quality.

In the semiconductor manufacturing process, specialty gases are used for various purposes, such as doping, cleaning, and etching. The quality and purity of these gases are critical for achieving the desired performance of the final semiconductor product.

Our  TIGER OPTICS™ CRDS (Cavity Ring-Down Spectroscopy) Gas Analyzers are used in the semiconductor industry to measure and monitor the concentration of various specialty gases used in the manufacturing process. These specialty gases include gases such as arsine, phosphine, and germane, which are used in the production of semiconductors for various applications. Our CRDS gas analyzers use laser spectroscopy to detect trace amounts of gases with high sensitivity and accuracy. They can measure a wide range of specialty gases, including impurities in these gases. The CRDS analyzer provides real-time and highly accurate measurement of these gases, allowing for precise control of the manufacturing process.

For example, in the doping process of semiconductors, gas analyzers can measure the concentration of the dopant gas and any impurities in real-time. This information can be used to adjust the gas flow rates and deposition parameters to maintain the desired doping concentration.

In addition, during the cleaning process, gas analyzers can measure the concentration of the cleaning gas and any by-products to ensure the proper removal of contaminants from the substrate.

Our CRDS (Cavity Ring-Down Spectroscopy) Gas Analyzers offer several benefits for monitoring specialty gases, including:

• High Sensitivity: CRDS technology is highly sensitive and can detect trace amounts of impurities in gas streams, making it an ideal tool for monitoring and controlling gas purity in specialty gas applications.
• Real-time Monitoring: Provide real-time data on gas purity, allowing for quick identification of process issues and adjustment of gas delivery systems to maintain optimal conditions.
• High Accuracy: Provides accurate measurements of gas impurities, with detection limits down to parts-per-trillion levels, ensuring the purity of gases used in specialty gas applications.
• Easy to Use: Are easy to install, operate, and maintain, with built-in calibration and verification features that simplify routine maintenance.
• Versatile: Can be used to monitor a wide range of specialty gases, including highly reactive gases, rare gases, and gas mixtures.
• Process Control: Can improve process control, reduce yield losses, and ensure consistent product quality.
• Cost-Effective: By ensuring the purity of gases used in specialty gas applications, our CRDS Gas Analyzers can help specialty gas manufacturers reduce costs associated with yield losses, process inefficiencies, and equipment downtime.

In semiconductor manufacturing, bulk gases such as nitrogen, oxygen, and hydrogen are used as process gases and carrier gases for deposition and etching processes. The quality of these gases is critical to the performance and reliability of the semiconductor products. Even trace levels of impurities in these gases can lead to defects in the final product, affecting its performance and reliability.

Our TIGER OPTICS™ CRDS (Cavity Ring-Down Spectroscopy) Gas Analyzers are used in the semiconductor industry to measure trace levels of impurities in bulk gases used in semiconductor manufacturing processes. These analyzers use a combination of laser-based spectroscopy and gas sample handling techniques to provide highly accurate and precise measurements of impurities in gases.

Our CRDS analyzers are used to measure trace levels of impurities in these bulk gases to ensure that they meet the required purity standards. The analyzers work by passing a laser beam through the gas sample in a high-precision optical cavity. The laser light is absorbed by the impurities in the gas sample, and the absorption is detected and quantified, providing a highly sensitive measurement of the impurity concentration.

These CRDS analyzers are capable of measuring a wide range of impurities in bulk gases, including moisture, oxygen, methane, carbon monoxide, and many others. These analyzers are highly sensitive and can detect impurities at levels as low as parts per billion (ppb) or parts per trillion (ppt), depending on the impurity and the gas being analyzed.

By using our CRDS analyzers for bulk gas analysis, semiconductor manufacturers can ensure that the bulk gases used in their manufacturing processes meet the required purity standards. This helps to ensure that the final products are of the highest quality and meet the stringent requirements of the industry.

In a cleanroom environment, where semiconductor manufacturing takes place, it is critical to maintain the air quality and prevent the introduction of any contaminants. Moisture and oxygen, in particular, can affect the quality and performance of the final product, and their levels must be monitored and controlled.

Our TIGER OPTICS™ CRDS (Cavity Ring-Down Spectroscopy) Gas Analyzers are also used in the semiconductor industry to measure and monitor the concentration of airborne contaminants, such as moisture and oxygen, which can adversely affect the semiconductor manufacturing process.

Our CRDS gas analyzers use laser spectroscopy to detect trace amounts of gases with high sensitivity and accuracy. They can measure a wide range of airborne contaminants, including moisture and oxygen. The CRDS analyzer provides real-time and highly accurate measurement of these gases, allowing for precise control of the manufacturing process.

For example, in the cleanroom environment, gas analyzers can measure the concentration of airborne contaminants and any impurities in real-time. This information can be used to adjust the air handling system to maintain the desired air quality.

In addition, during the manufacturing process, gas analyzers can measure the concentration of airborne contaminants, such as moisture and oxygen, to ensure that the production environment remains within the required specifications for the manufacturing process.

In semiconductor manufacturing facilities, our EXTREL™ APIMS is used to monitor the air quality in cleanrooms and other controlled environments where semiconductor products are manufactured. Airborne molecular contaminants can cause defects in semiconductor products, leading to reduced performance and reliability. Therefore, it is essential to monitor and control the levels of these contaminants in the air to ensure that the final products meet the required standards.

APIMS instruments can be used to detect and quantify a wide range of airborne molecular contaminants, including volatile organic compounds (VOCs), acids, and other contaminants. These instruments are highly sensitive and can detect trace levels of contaminants in the air, making them essential for monitoring the air quality in semiconductor manufacturing facilities.

In the semiconductor industry, a variety of analytical instruments are used for lab testing, safety monitoring, and compliance with regulatory standards. Among these instruments are spectrometers, water quality analyzers, electrochemical analyzers, and chilled mirror analyzers.

Our EXTREL™ Quadrupole Spectrometers are used in semiconductor labs to measure the spectral properties of materials used in the manufacturing process. These instruments can measure the reflectivity, transmission, and absorption of light by a material, providing important information about its optical properties. Spectrometers are commonly used to analyze thin films and coatings on semiconductor surfaces, and to measure the composition and thickness of these materials.

Water quality analyzers are used to monitor the quality of water used in semiconductor manufacturing processes. Water is used extensively in the semiconductor industry, and it must be of high purity to prevent contamination of the final product. Water quality analyzers can measure a variety of parameters, including pH, conductivity, total organic carbon, and other contaminants. These instruments are essential for ensuring that the water used in semiconductor manufacturing meets the required standards.

Chilled mirror analyzers are used to measure the dew point of gases, including dry air and process gases used in the semiconductor industry. These instruments use a chilled mirror to measure the temperature at which water vapor in a gas condenses into liquid. By measuring the dew point, chilled mirror analyzers can provide information about the moisture content of the gas, which is important for ensuring the quality and performance of semiconductor products.

In semiconductor manufacturing, it is crucial to maintain a dry environment to prevent moisture from contaminating the product. Any moisture in the process gases used during the manufacturing process can lead to defects in the final product, affecting its performance and reliability. Therefore, it is essential to monitor the moisture content of these gases to ensure that they meet the required standards.

Aluminum Oxide Dew Point Meters and Transmitters use a sensing element made of aluminum oxide to measure the dew point temperature of the gas. The sensing element is coated with a thin film of aluminum oxide, which absorbs moisture from the gas. As the temperature of the sensing element is lowered, the moisture in the aluminum oxide film condenses, and the dew point temperature is reached.