Process Insights provides advanced ultra-high purity (UHP) gas analyzers for semiconductor manufacturing, electronic and specialty gas production, clean energy, pharmaceutical, research, and other critical applications. Our TIGER OPTICS™ technologies use Cavity Ring-Down Spectroscopy (CRDS), Quantum Cascade Laser (QCL), and Atmospheric Pressure Ionization Mass Spectrometry (APIMS) to continuously detect trace impurities at parts-per-billion (ppb) and parts-per-trillion (ppt) levels, helping customers protect product quality, improve process control, prevent contamination, and maximize production yield.

• What is Cavity Ring Down Spectroscopy?
• What is CRDS?
• Technical Specifications of Tiger Optics CRDS
• Cavity Ring-Down Spectroscopy: Principles, Applications, and Benefits,
• Trace Moisture Analysis with CRDS
• What is a trace moisture analyzer

What Is Ultra-High Purity Gas Analysis?

Ultra-high purity gas analysis is the measurement of extremely low concentrations of impurities in bulk, specialty, and process gases. In semiconductor and other high-purity manufacturing processes, contaminants at ppb or ppt concentrations can affect product quality, process performance, equipment reliability, and manufacturing yield.

Process Insights UHP gas analyzers provide continuous measurement of contaminants including H₂O, O₂, CO, CO₂, CH₄, NH₃, HCl, HF and other trace species, depending on the analyzer and application.

Cavity Ring-Down Spectroscopy (CRDS)

TIGER OPTICS™ CRDS is a laser-based optical measurement technology designed for highly sensitive and selective trace gas analysis.

Laser light travels repeatedly between highly reflective mirrors inside an optical cavity. Gas molecules absorb light at characteristic wavelengths, changing the rate at which the light decays—or “rings down.” Measuring this decay enables direct determination of trace gas concentration.

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EMEAI (includes India): info.emeai@process-insights.com

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CHINA:  info.cn@process-insights.com

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Why Is UHP Gas Monitoring Critical?

Ultra-high purity gases are critical raw materials in semiconductor fabrication and other advanced manufacturing processes. Even extremely low levels of contamination can create process variability, affect sensitive manufacturing steps, and potentially impact finished-product quality.  Continuous UHP gas analysis helps manufacturers:

• Detect contamination before it impacts production
• Verify incoming bulk and specialty gas purity
• Monitor critical quality and impurity control points
• Protect sensitive processes and high-value products
• Identify gas-system excursions quickly
• Improve process consistency
• Reduce contamination-related downtime
• Support increasingly stringent purity requirements
• Protect manufacturing yield

Why Use CRDS for UHP Gas Analysis?

CRDS provides:

• ppb and ppt sensitivity
• Direct optical measurement
• Fast response
• Excellent long-term stability
• High selectivity
• Continuous measurement
• No consumable sensors
• Low maintenance requirements

Process Insights provides analytical solutions for:

Bulk Gas Monitoring
Continuously verify UHP gas quality throughout fab gas-distribution systems.

Incoming Quality Control (IQC)
Verify gas purity before gases enter critical manufacturing processes.

Continuous Quality Control (CQC)
Continuously monitor gas quality at critical points throughout the distribution system.

Airborne Molecular Contamination (AMC)
Monitor trace HCl, HF, NH₃ and other molecular contaminants that can affect cleanrooms, wafers, reticles, FOUPs and sensitive production equipment.

Point-of-Use / Tool Monitoring
Monitor critical impurities closer to the process or manufacturing tool.

Mobile Analytical Monitoring
Move analytical capability throughout the fab using GO-cart™ configurations.