Gas Quality Control & Safety Monitoring APPLICATIONS for Semiconductor Fabs

Semiconductors are considered the brains of modern electronics. Our TIGER OPTICS™ Cavity Ring-Down Spectroscopy (CRDS) gas analyzers seamlessly detect parts-per-billion (ppb) and parts-per-trillion (ppt) levels and delivers bulk gas monitoring for trace H2, H2O, O22, CH4, CO, CO2, Kr, NH3, and Xe, UHP ammonia for HB LED production, tool monitoring for trace H2O and HF, and continuous AMC monitoring for ambient HCl, HF, and NH3. 

We know your process and how critical it is for you to protect precious and limited resources.


Get the most reliable, most precise gas analysis technologies available on the market today.  We will work to match your needs and budget and provide the optimal, and most stable process analysis solution for your application. 

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    It’s one thing to be monitoring and have high confidence in your high purity bulk and specialty gases at the post-purifier stage but a lot can change as that same gas then travels through the various fab distribution systems and arrives at the equipment or process chamber. Unless you are monitoring close to the substrate or in the process chamber exhaust, there is risk that high partial pressures of moisture are present during processing, resulting in defects causing yield loss and reliability issues. 

    Hydrogen fluoride is essential to the semiconductor process. Able to operate in a pressure range from 50 Torr to 15 psig, the TIGER OPTICS™ HALO™ RP trace level analyzer provides users with the unmatched accuracy, reliability, speed of response and ease of operation.  The Halo RP is available for two different analytes, H2O and HF, to ensure that your product is protected from all harmful molecules.  Ideal for gas quality control, research & development, semiconductor process tools, and UHP ammonia and high-brightness LED.

    • Tool monitoring for trace H2O and HF
    • Low pressure, low temperature EPI, ALD, MOCVD process monitoring
    • Real-time moisture measurement in load lock, transfer, and process chambers

    Electronic gases and semiconductor gases are process gases used in electronic manufacturing. The electronic gases include pure gases and gas mixtures which are specially configured for specific manufacturing processes.  Electronics gases must be high purity gases. Precise gas delivery is at the core of semiconductor fabrication.  Many gases must be delivered to produce critical features on silicon wafers. These are electronic specialty gases (ESG). Electronic gases are important because they create the chemical reactions needed to shape the semiconductor’s electrical properties.  These gases include nitrogen, oxygen, argon and hydrogen.

    Our TIGER OPTICS™ Cavity Ring-Down Spectroscopy trace gas analyzers have supported the semiconductor industry and other micro-electronic manufacturing sectors.  Based on their superior sensitivity, great stability and unparalleled uptime, and free of periodic maintenance, with no moving parts or consumables they are the ideal choice for semiconductor fabs. SEMI F-112 designates CRDS as the standard in determining moisture dry-down characteristics of ultra-high-purity gases and their respective delivery systems.


    Specialty gases are used across many applications in the semiconductor chip manufacturing process. Specialty gases for the semiconductor manufacturing include industrial gases, ammonia, methane, fluorinated compounds and sulfur hexafluoride. Electronic process gases must be manufactured, used, and tested based on various standards. 

    Based upon our CRDS gas analyzer performance, the SEMI F-112 standard calls out CRDS as the technology of choice in determining moisture dry-down characteristics of high-purity gas systems. To check incoming or point-of-use quality, our CRDS analyzers monitor for O2, H2O, CH4, CO, CO2 and more down to parts-per-billion (ppb) and even parts-per-trillion (ppt) levels. A special low-pressure version, our TIGER OPTICS™ Cavity Ring-Down Spectroscopy (CRDS) HALO™ LP monitors for impurities in hydrides, including arsine, phosphine and ammonia.

    If low-ppb moisture measurement in pure ammonia is required, our ALOHA+ H2O specializes in this application.  Our CRDS analyzer portfolio delivers bulk gas monitoring for trace H2, H2O, O2, C4, CO, CO2, Kr, N3, and Xe, UHP ammonia for HB LED production, tool monitoring for trace H2O and HF, and continuous AMC monitoring for ambient HCl, HF, and NH3.


    Airborne molecular contamination (AMC) impacts semiconductor fabs and cleanrooms.  It is sometimes referred to as chemical contamination. Every material introduced into a cleanroom is a potential source of airborne molecular contamination (AMC).  AMC can cause changes in a wafer’s electrical properties at the parts-per-trillion (ppt) level in air.  This contamination must be taken very seriously.  Volatile Organic Compounds (VOC) are present even in clean production environments.   Airborne contaminants reduce yield-quality, impact tools, and are costly when not monitored. 

    Exposure of wafers to AMCs are a great concern to semiconductor manufacturers, which can cause yields to drop.  Our TIGER OPTICS™ T-I Max™ monitors critical HCl, HF, NH3 and more in cleanroom environments.


    Many hazards can occur in semiconductor fabrication (fab) and laboratories.  Semiconductor Equipment and Materials International (SEMI) standards exist for process liquid heating systems, sizing and identifying flow, devices for gas cylinder valves, equipment safety labeling, exhaust ventilation, ergonomics engineering for equipment, and risk assessment.  For instance, moving specialty gas cylinders should be accompanied by periodic leak testing.  Also, the Semiconductor Industry Association has taken a proactive stance on improving safety across the semiconductor manufacturing process as well as protecting employees.  Our solutions support a safe environment plus adhere to health and safety (EHS) standards across all of our semiconductor fabrication.


    In the semiconductor industry numerous processes need ultra-pure water for their operation. Any disturbance in water quality may lead to a cost intensive plant shut down – this should be avoided. Therefore, continuous and fast water analysis is required to meet the high-quality standards set. 

    The high qua­lity and pu­rity re­quire­ments for pro­duct and pro­cess safe­ty are met by accu­rate and re­liable online TOC water quality moni­to­ring in the low­est le­vels.  Ultra-pure water is prepared under particularly stringent specifications. It is a matter of ensuring purity in respect of all types of contaminants: organic/inorganic compounds, dissolved/solid or volatile/non-volatile components, dissolved gases, reactive/inert substances etc. Depending on the respective application, requirements regarding UPW purity are defined in norms such as ASTM D5127 and SEMI F63.


    Vacuum Ultraviolet (VUV) lithography is a process used in semiconductor manufacturing to create tiny features on semiconductor wafers using extreme ultraviolet light. Quadrupole mass spectrometers can be used in VUV lithography to monitor the purity of gases used in the lithography process.

    By monitoring the gas purity with a quadrupole mass spectrometer, VUV lithography manufacturers can quickly detect any impurities that may be present in the gas stream and take corrective action to ensure the quality of the lithography process. This can help to improve the yield and quality of the final semiconductor product.

    Our EXTREL™ Flange Mounted Mass Spectrometer, the MAX-QMS™ system offers the high sensitivity and resolution needed to fully characterize the material outgassing and what is produced during the breakdown of the photoresists.


    Molecular Beam Epitaxy (MBE) is a technique used in materials science and semiconductor device fabrication to grow thin films of various materials with extremely precise control over thickness and composition. MBE is a type of vapor deposition process, in which the materials are evaporated in a vacuum chamber and deposited onto a substrate, typically a single crystal wafer, to create a thin film.

    Our EXTREL™ Quadrupole Mass Spectrometer are commonly used in Molecular Beam Epitaxy (MBE) to monitor and control the quality of the deposited films. The high vacuum environment of the MBE chamber, along with the controlled deposition rate and composition, ensure that the deposited films have high purity and are free from contamination.  However, it is still important to monitor the gas-phase environment in the MBE chamber during the deposition process to ensure that the deposited films have the desired composition and properties. This is where quadrupole mass spectrometry comes into play.

    Our MAX-QMS™ Flange Mounted Mass Spectrometer meets both requirements of high sensitivity and low noise electronics. This system can provide partial pressure detection down to 10-16 mbar and allow the user to visually see signals as low as 3 counts per second.


    Plasma Etch, Chemical Vapor Deposition (CVD) and Plasma-Enhanced Chemical Vapor Deposition (PECVD) applications require a thorough understanding of the complex chemistries involved in the processes. Also critical to the processes is the ability to monitor low-level components.

    Our EXTREL™ Quadrupole Mass Spectrometer can be used in PECVD to monitor the gas-phase environment in the plasma reactor during the deposition process. This is important because the gas-phase environment can affect the composition and quality of the deposited thin films. By measuring the partial pressure of various gases in the plasma reactor, the quadrupole mass spectrometer can provide information on the composition of the gas-phase environment and can be used to adjust the deposition conditions to ensure the desired film properties.


    In the semiconductor industry, scrubbers and burn boxes are used to safely dispose of hazardous gases used in the manufacturing process, such as chlorinated and fluorinated gases. Scrubber and burn box efficiency are important for meeting regulatory requirements and ensuring the safety of workers and the environment. Regular monitoring and maintenance of scrubbers and burn boxes are necessary to ensure their efficiency and effectiveness in removing hazardous gases.

    Our EXTREL™ MAX-QMS™ Flange Mounted Mass Spectrometers offer high sensitivity and resolution with a variety of mass ranges to fit your needs. MAX300-RTG™ 2.0 Process Gas Analysis Mass Spectrometer and the MAX300-LG™ Laboratory Gas Analysis Mass Spectrometer offer analysis from 100% down to 10 parts per billion (ppb) with unmatched accuracy and repeatability.  Our systems are used to aid the effort to reduce emissions and ensure compliance with applicable regulations is to monitor the efficiency of abatement systems.


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