Gas Quality Control & Safety Monitoring APPLICATIONS

Semiconductors are considered the brains of modern electronics. Our CRDS gas analyzers seamlessly detect parts-per-billion (ppb) and parts-per-trillion (ppt) levels and delivers bulk gas monitoring for trace H2, H2O, O2, CH4, CO, CO2, Kr, NH3, and Xe, UHP ammonia for HB LED production, tool monitoring for trace H2O and HF, and continuous AMC monitoring for ambient HCl, HF, and NH3. Free of periodic maintenance, with no moving parts or consumables, featuring built-in calibration and zero drift, our CRDS analyzers are the top choice of the world’s leading semiconductor fabs. Based solely on experience with our analyzers, SEMI F-112 designates CRDS as “THE STANDARD” in determining moisture dry-down characteristics of ultra-high-purity gases and their respective delivery systems.

Process Insights:  We are revolutionizing measurement everywhere!


We offer the ALOHA+ H2O, the ultimate moisture-in-ammonia analyzer that refines the detection to levels below 3 ppb, achieving significantly improved sensitivity compared to the leading analyzer to date. The HALO LP H2O is the standard bearer for this application with a detection limit of 9 ppb. Both Tiger analyzers exceeds the industry’s need to detect moisture in ammonia at 12 ppb or less. Higher concentrations of moisture negatively affect the luminescence of HB LEDs and diminish process yields.

High-brightness LEDs, or HB-LEDs, are semiconductor-based devices featuring higher luminosity than traditional LEDs, and they can withstand higher current levels and power dissipation.  High-brightness LEDs offer brighter, cooler light, with lower power consumption and longer life than traditional lighting. Tool manufacturers and the gas companies supplying ammonia use our CRDS analyzers for moisture analysis in ammonia, which is the favored source of nitrogen for the production of gallium nitride (GaN) compound semiconductor wafers. Tiger’s best-in-class analyzers can ensure ultra-dry ammonia throughout the process, from the gas bottle to the MOCVD tool. To monitor directly at the tool level, we offer the HALO RP and HALO QRP, which are designed for low-pressure environments.


Explore our real-time monitoring for trace H2O and HF in semiconductor process equipment.  Our HALO and T-I Max systems are used extensively in Atomic Layer Deposition (ALD), Low-Temperature Epitaxy and MOCVD chambers. The ability to measure moisture in chamber exhaust lines provides a total quality check for incoming gases, cleaning gases, chamber state and/or leaks and purge procedures. The HALO RP and Laser Trace system operates at pressures as low as 50 Torr. While the HALO RP is a single-channel system, the Laser Trace 3x can monitor up to four points at the chamber simultaneously during purge or ramp steps in the standard production runs. The new HALO QRP has been developed to monitor the latest generation of tools at pressures as low as 1 Torr (and below). Its fast speed of response and wide pressure range (as high as 1000 Torr) allows the use of a manifold system to connect multiple load locks, wafer transfer and deposition chambers to a single instrument.

other applications


Americas +1 (215) 656-4000
EMEA +49 69 20436910
China/APAC +86 400 086 0106

our semiconductor solutions flyer


The semiconductor industry requires consistent and safe fabrication processes. Integrating proactive process control tools helps achieve higher levels of efficiency, high throughput and safety.   

It’s one thing to be monitoring and have high confidence in your high purity bulk and specialty gases at the post-purifier stage but a lot can change as that same gas then travels through the various fab distribution systems and arrives at the equipment or process chamber. Unless you are monitoring close to the substrate or in the process chamber exhaust, there is risk that high partial pressures of moisture are present during processing, resulting in defects causing yield loss and reliability issues. For example, in semiconductor fabrication, moisture or hydrogen fluoride present in low-temperature epitaxy (LTE) can affect the quality and strain of the epi layers. In MOCVD processing with hydride gases, excess moisture can lead to significant reduction in luminescence and yield loss.

Hydrogen fluoride is essential to the semiconductor process. Able to operate in a pressure range from 50 Torr to 15 psig, the HALO RP trace level analyzer provides users with the unmatched accuracy, reliability, speed of response and ease of operation.  The HALO RP is available for two different analytes, H2O and HF, to ensure that your product is protected from all harmful molecules.  Ideal for gas quality control, research & development, semiconductor process tools, and UHP ammonia and high-brightness LED.

  • Tool monitoring for trace H2O and HF
  • Low pressure, low temperature EPI, ALD, MOCVD process monitoring
  • Real-time moisture measurement in load lock, transfer, and process chambers


Electronic gases and semiconductor gases are process gases used in electronic manufacturing. The electronic gases include pure gases and gas mixtures which are specially configured for specific manufacturing processes.  Electronics gases must be high purity gases. Precise gas delivery is at the core of semiconductor fabrication.  Many gases must be delivered to produce critical features on silicon wafers. These are electronic specialty gases (ESG).  Electronic gases are important because they create the chemical reactions needed to shape the semiconductor’s electrical properties.  These gases include nitrogen, oxygen, argon and hydrogen.

Our Cavity Ring-Down Spectroscopy trace gas analyzers have supported the semiconductor industry and other micro-electronic manufacturing sectors.  Based on their superior sensitivity, great stability and unparalleled uptime, and free of periodic maintenance, with no moving parts or consumables they are the ideal choice for semiconductor fabs. SEMI F-112 designates CRDS as the standard in determining moisture dry-down characteristics of ultra-high-purity gases and their respective delivery systems.

  • Bulk gas monitoring for trace H2, H2O, O2, CH4, CO, CO2, Kr, NH3, and Xe
  • Atmospheric Pressure Mass Spectrometers for real-time, ppt-level, multi-impurity analysis – VeraSpec APIMS
  • Electronic Gases – Bulk gas continuous quality control monitoring (CQC) trace gas analyzers for H2O, O2, H2, CH4, NH3, CO, CO2, N2, and more

electronic gases application note


Specialty gases are used across many applications in the semiconductor chip manufacturing process. Specialty gases for the semiconductor manufacturing include industrial gases, ammonia, methane, fluorinated compounds (CF4, C2F6, C2F8, NF3), and sulfur hexafluoride. Electronic process gases must be manufactured, used, and tested based on various standards. Specialty gases are critical components in semiconductor chip manufacturing.  Specialty gases must meet or exceed a particular set of specifications.  Ultra-high purity (UHP) gases include acetylene, argon, carbon dioxide, hydrogen, helium, nitrogen, and oxygen.

Based upon our CRDS gas analyzer performance, the SEMI F-112 standard calls out CRDS as the technology of choice in determining moisture dry-down characteristics of high-purity gas systems. To check incoming or point-of-use quality, our CRDS analyzers monitor for O2, H2O, CH4, CO, CO2 and more down to parts-per-billion (ppb) and even parts-per-trillion (ppt) levels. A special low-pressure version, the HALO LP monitors for impurities in hydrides, including arsine, phosphine and ammonia. If low-ppb moisture measurement in pure ammonia is required, our ALOHA+ H2O specializes in this application.  Our CRDS analyzer portfolio delivers bulk gas monitoring for trace H2, H2O, O2, CH4, CO, CO2, Kr, NH3, and Xe, UHP ammonia for HB LED production, tool monitoring for trace H2O and HF, and continuous AMC monitoring for ambient HCl, HF, and NH3.

  • UHP ammonia for HB LED production
  • Quality monitoring for process specialty gases including HCl, Cl2, CO2, N2O, NF3, CxFy, Xe and more
  • Corrosion-resistant versions available
  • Specialty Gases – Moisture impurity monitoring in welding gases, and specialty gases including corrosive (HCl, HBr, Cl2), rare gases (Xe, Kr, He, Ne), fluorinated gases, (SF6, NF3, CF4), hydrides (NH3, PH3, GeH4, AsH3), and pure CO2

specialty gases flyer


Airborne molecular contamination (AMC) impacts semiconductor fabs and cleanrooms.  It is sometimes referred to as chemical contamination. Every material introduced into a cleanroom is a potential source of airborne molecular contamination (AMC).  AMC can cause changes in a wafer’s electrical properties at the parts-per-trillion (ppt) level in air.  This contamination must be taken very seriously.  Volatile Organic Compounds (VOC) are present even in clean production environments.   Airborne contaminants reduce yield-quality, impact tools, and are costly when not monitored.  Exposure of wafers to AMCs are a great concern to semiconductor manufacturers, which can cause yields to drop.  Our T-I Max CEM analyzers monitor critical HCl, HF, NH3 and more in cleanroom environments.

  • Impurity Analysis – fixed and mobile applications – monitoring Spec Gases including Corrosive Gases: HCL, HBr, CL2
  • GO-Cart™ Mobile Cart for AMC Monitoring Analyzers
  • Continuous AMC monitoring for ambient air in Clean Room Air HCl, HF, and NH3

Next-Generation AMC Monitors 


Many hazards can occur in semiconductor fabrication (fab) and laboratories.  Semiconductor Equipment and Materials International (SEMI) standards exist for process liquid heating systems, sizing and identifying flow, devices for gas cylinder valves, equipment safety labeling, exhaust ventilation, ergonomics engineering for equipment, and risk assessment.  For instance, moving specialty gas cylinders should be accompanied by periodic leak testing.  Also, the Semiconductor Industry Association has taken a proactive stance on improving safety across the semiconductor manufacturing process as well as protecting employees.  Our solutions support a safe environment plus adhere to health and safety (EHS) standards across all of our semiconductor fabrication.

AMC application note


In the semiconductor industry numerous processes need ultra-pure water for their operation. Any disturbance in water quality may lead to a cost intensive plant shut down – this should be avoided. Therefore, continuous and fast water analysis is required to meet the high-quality standards set.  The high qua­lity and pu­rity re­quire­ments for pro­duct and pro­cess safe­ty are met by accu­rate and re­liable on-line TOC moni­to­ring in the low­est le­vels.  Ultra-pure water is prepared under particularly stringent specifications. It is a matter of ensuring purity in respect of all types of contaminants: organic/inorganic compounds, dissolved/solid or volatile/non-volatile components, dissolved gases, reactive/inert substances etc. Depending on the respective application, requirements regarding UPW purity are defined in norms such as ASTM D5127 and SEMI F63.

To Top

Questions? We’re here to help.