CRDS Laser-Based Analyzer
PROTECT YOUR PROCESS WITH THE HALO QRP
Modern semiconductor deposition processes—from low-temperature epitaxy to ALD and MOCVD—operate routinely at chamber pressures far below atmosphere and approach the single-digit torr range. At the same time, process temperatures are continuously decreasing. Under these conditions, residual moisture in the chamber poses a significant threat to process quality and production yields.
Our TIGER OPTICS™ HALO™ QRP for Moisture Monitoring in Low Pressure Chambers is optimized to operate under these low-pressure conditions and deliver exact and reliable real-time measurement to verify moisture residue in, for example, the load lock, transfer and process chambers before H2O contaminants compromise the subsequent process step. Based on our proven Cavity Ring-Down Spectroscopy (CRDS) technology, the HALO QRP sets new standards in ease-of-use and measurement precision for this application and operates at chamber pressures as low as 1 Torr.
DESIGNED FOR TRACE LEVEL MOISTURE ANALYSIS IN LOW PRESSURE (<50 TORR) APPLICATIONS, THE HALO QRP OFFERS:
- Moisture detection at partial pressure of 1 µTorr and below
- Absolute accuracy and excellent precision
- Wide dynamic range—over four orders of magnitude
- Low cost of ownership and operational simplicity
- Clean technology—no external calibration gases required
- Compact analyzer footprint, also available as OEM module for equipment/system integration
APPLICATIONS
- Gas Quality Control
- Research & Development
- Semiconductor Process Tools
- UHP Ammonia & High-Brightness LEDs
H2O |
0 – 12 mTorrpp |
1 μTorrpp |
0.5 μTorrpp |
ANALYZE WITH EASE™
MOISTURE MONITORING FOR
LOW-PRESSURE CHAMBERS
ANALYZE WITH EASE™
MOISTURE MONITORING FOR
LOW-PRESSURE CHAMBERS
Learn about our service, technical support, spares, and our CRDS Analyzer | Performance Verification Program
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