PROTECT YOUR PRODUCT WITH THE HALO RP

It’s one thing to be monitoring and have high confidence in your high purity bulk and specialty gases at the post-purifier stage but a lot can change as that same gas then travels through the various fab distribution systems and arrives at the equipment or process chamber. Unless you are monitoring close to the substrate or in the process chamber exhaust, there is risk that high partial pressures of moisture are present during processing, resulting in defects causing yield loss and reliability issues.  For example, in semiconductor fabrication, moisture or hydrogen fluoride present in low-temperature epitaxy (LTE) can affect the quality and strain of the epi layers. In MOCVD processing with hydride gases, excess moisture can lead to significant reduction in luminescence and yield loss.

Able to operate in a pressure range from 50 Torr to 15 psig, our TIGER OPTICS™ HALO™ RP trace level analyzer provides users with the unmatched accuracy, reliability, speed of response and ease of operation that users of our analyzers have come to expect. The HALO RP is available for two different analytes, H₂O and HF, to ensure that your product is protected from all harmful molecules.  

Monitoring for contaminants close to the substrate or in the process chamber exhaust, significantly reduces the risk of process issues that cause product yield losses.

BENEFITS

• Low parts per billion (ppb) detection capability in inert, acid, and hydride background gases
• Absolute measurement (freedom from calibration gases)
• Wide dynamic range—over four orders of magnitude
• Low cost of ownership and operational simplicity
• Clean technology—no external calibration gases required
• CRDS technology, designated by SEMI-F112 06-13 Standard