HALO KA H2O
PPT-Level Trace Moisture Analyzer UHP Bulk & Specialty Gases
HALO KA H₂O Trace Moisture Analyzer UHP Bulk & Specialty Gases
Moisture is one of the most common contaminants affecting ultra-high-purity gas systems. Even trace amounts of water vapor can reduce semiconductor yields, contaminate specialty gases, poison catalysts, and impact manufacturing quality.
The TIGER OPTICS™ HALO KA™ H₂O uses proven Cavity Ring-Down Spectroscopy (CRDS) technology to continuously measure trace moisture at parts-per-trillion (ppt) levels across a wide range of bulk gases, specialty gases, and complex gas mixtures. With drift-free performance, built-in zero verification, and calibration-free operation, the HALO KA H₂O delivers reliable, low-maintenance moisture monitoring for critical industrial and semiconductor processes. Contact us for more information.
Features of the HALO KA H₂O UHP Gas Analyzer with CRDS Technology
- Ultra-high sensitivity: Detects H₂O levels down to 100 ppt
- Compatible with a wide range of gases: Ideal for bulk gases, specialty gases, and reactive mixtures
- CRDS technology ensures laser-based precision and long-term stability
- Plug-and-play installation with easy operation and minimal upkeep
- Built-in zero verification for simplified maintenance
- Perfect for semiconductor-grade gas purity control
Why Choose the HALO KA H₂O?
The HALO KA H₂O combines field-proven CRDS technology with exceptional sensitivity and application flexibility.
Benefits
- Detects moisture down to 100 ppt in selected gas matrices
- Continuous online moisture monitoring
- Absolute optical measurement with no routine calibration gases
- Built-in zero verification
- Fast response to process upsets
- Wide dynamic measurement range
- Low cost of ownership
- Minimal maintenance
- Compatible with numerous bulk, specialty, inert, and reactive gases
- Compact analyzer for laboratory or production environments
DETECTION CAPABILITY
|
Detection and Matrix |
Range |
LDL (3σ) |
Precision (1σ) @ zero |
| H2O in N2 | 0 – 20 ppm | 300 ppt | 100 ppt |
| H2O in He | 0 – 4 ppm | 100 ppt | 20 ppt |
| H2O in Ar | 0 – 9 ppm | 130 ppt | 45 ppt |
| H2O in H2 | 0 – 16 ppm | 200 ppt | 70 ppt |
| H2O in D2 (2H2) | 0 – 14 ppm | 900 ppt | 300 ppt |
| H2O in O2 | 0 – 10 ppm | 150 ppt | 50 ppt |
| H2O in Clean Dry Air (CDA) | 0 – 18 ppm | 300 ppt | 100 ppt |
| H2O in CO | 0 – 24 ppm | 600 ppt | 200 ppt |
| H2O in CO2 | 0 – 25 ppm | 800 ppt | 300 ppt |
| H2O in 1% GeH4/99% H2 | 0 – 16 ppm | 7 ppb | 2.5 ppb |
| H2O in 10% GeH4/90% H2 | 0 – 16 ppm | 35 ppb | 12 ppb |
| H2O in COS | 0 – 23 ppm | 12 ppb | 4 ppb |
| H2O in Ne | 0 – 5 ppm | 100 ppt | 30 ppt |
| H2O in Kr | 0 – 11 ppm | 160 ppt | 60 ppt |
| H2O in Xe | 0 – 13 ppm | 250 ppt | 90 ppt |
| H2O in Cl2 | 0 – 25 ppm (Corrosion-resistant material required) |
650 ppt | 220 ppt |
| H2O in HCl | 0 – 50 ppm (Corrosion-resistant material recommended) |
1200 ppt | 400 ppt |
| H2O in HBr | 0 – 100 ppm (Corrosion-resistant material required) |
12 ppb | 4 ppb |
| H2O in 10% BCI3/90% N2 | 0 – 20 ppm | 12 ppb | 4 ppb |
| H2O in SF6 | 0 – 15 ppm | 400 ppt | 140 ppt |
| H2O in NF3 | 0 – 20 ppm | 600 ppt | 200 ppt |
| H2O in CF4 | 0 – 15 ppm | 800 ppt | 300 ppt |
| H2O in C2F6 | 0 – 15 ppm | 1200 ppt | 400 ppt |
| H2O in C3F8 | 0 – 20 ppm | 1200 ppt | 400 ppt |
| H2O in C4F6 | 0 – 25 ppm | 150 ppb | 50 ppb |
| H2O in C4F8 | 0 – 20 ppm | 1200 ppt | 400 ppt |
| H2O in C5F8 | 0 – 32 ppm | 8 ppb | 3 ppb |
| H2O in H2S | 0 – 40 ppm | 200 ppb | 70 ppb |
| H2O in 1% GeH4/99% H2 | 0 – 16 ppm | 7 ppb | 2.5 ppb |
| H2O in 10% GeH4/90% H2 | 0 – 16 ppm | 35 ppb | 12 ppb |
| H2O in 1% PH3/99% H2 | 0 – 4 ppm | 1 ppb | 0.4 ppb |
| H2O in 1% B2H6/99% H2 | 0 – 16 ppm | 10 ppb | 3.5 ppb |
| H2O in 2% B2H6/98% H2 | 0 – 16 ppm | 10 ppb | 3.5 ppb |
SPECIFICATIONS
| Performance | |
|---|---|
| Operating range | See Detection Capability table |
| Detection limit (LDL, 3σ/24h) | See Detection Capability table |
| Precision (1σ, greater of) | ± 0.75% or 1/3 of LDL |
| Accuracy (greater of) | ± 4% or LDL |
| Speed of response | < 2 minutes to 95%* |
| Environmental conditions | 10°C to 40°C, 30% to 80% RH (non-condensing) |
| Storage temperature | -10°C to 50°C |
| Gas Handling System and Conditions | |
| Wetted materials | 316L stainless steel (optional corrosion-resistant material), 10 Ra surface finish |
| Gas connections | 1/4” male VCR inlet and outlet |
| Leak tested to | 1 x 10-9 mbar l / sec |
| Inlet pressure | 10 − 125 psig (1.7 − 9.6 bara) |
| Flow rate | 0.05 – 1.8 slpm |
| Sample gases | Most inert, toxic, passive and corrosive matrices |
| Gas temperature | Up to 60°C |
| Dimensions, H x W x D | |
| Standard sensor | 8.73″ x 8.57″ x 23.6″ (222 mm x 218 mm x 599 mm) |
| Sensor rack (fits up to two sensors) | 8.73″ x 19.0″ x 23.6″ (222 mm x 483 mm x 599 mm) |
| Weight | |
| Standard sensor | 28 lbs (12.7 kg) |
| Electrical and Interfaces | |
| Platform | Max series analyzer |
| Alarm indicators | 2 user programmable, 1 system fault, Form C relays |
| Power requirements | 90 − 240 VAC, 50/60 Hz |
| Power consumption | 40 Watts max. |
| Signal output | Isolated 4−20 mA |
| User interfaces | 5.7” LCD touchscreen, 10/100 Base-T Ethernet |
| USB, RS-232, RS-485, Modbus TCP (optional) | |
| Data Storage | Internal or external flash drive |
| Certification | CE Mark |
| Patents | |
| U.S. Patent #7,277,177 | |
| *with Speed+ activated | |
Serani™ Max Analyzer Interface Software allows you to have remote access from your computer or laptop for our latest CRDS generation analyzers, such as the Halo KA Max and T-I Max. The Windows-based software package communicates with the analyzer through Ethernet and allows full control of the system conveniently from your desk.
Typical Gases Measured
The HALO KA™ H₂O supports trace moisture analysis in a broad range of gases, including:
- Hydrogen (H₂)
- Nitrogen (N₂)
- Oxygen (O₂)
- Argon (Ar)
- Helium (He)
- Neon (Ne)
- Krypton (Kr)
- Xenon (Xe)
- Carbon Monoxide (CO)
- Carbon Dioxide (CO₂)

SALES | TRAINING INQUIRIES
AMERICAS: info.americas@process-insights.com
EMEAI (includes India): info.emeai@process-insights.com
APAC: info.apac@process-insights.com
CHINA: info.cn@process-insights.com

Applications
Semiconductor Manufacturing
Monitor trace moisture throughout semiconductor gas distribution systems to protect wafer yield and process stability.
Applications include:
- Bulk gas monitoring
- Specialty gas monitoring
- Gas cabinets
- Point-of-use monitoring
- Process tool gas verification
- Purifier performance monitoring
Bulk Industrial Gas Production
Continuously verify moisture specifications during gas production, storage, and distribution.
Typical gases include:
- Nitrogen
- Oxygen
- Argon
- Helium
- Hydrogen
- Carbon dioxide
Chemical & Petrochemical Processing
Protect catalysts and improve process efficiency by monitoring moisture in:
- Feed gases
- Hydrogen recycle streams
- Utility gases
- Process gases
- Dry gas systems
Research & Development
Ideal for laboratories requiring continuous trace moisture measurements in:
- Materials science
- Process development
- Analytical chemistry
- Gas purity research
- University and government laboratories
Specialty Gas Manufacturing
Maintain gas purity before cylinder filling and shipment.
Applications include:
- Electronic specialty gases
- Calibration gases
- Gas blending
- Cylinder filling
- Quality assurance laboratories
Hydrogen Production & Distribution
Protect hydrogen quality by continuously monitoring moisture during:
- Hydrogen purification
- Compression
- Storage
- Distribution
- Fuel-cell hydrogen production
Air Separation Units (ASU)
Measure trace moisture to help prevent freeze-up and maintain product quality in:
- Nitrogen production
- Oxygen production
- Argon recovery
- Cryogenic distillation
- Bulk gas storage


































