CQC Gas Monitoring Solutions
Integrated System for Semiconductor Purity Control
Continuous Quality Control (CQC) Gas Monitoring Solutions for Semiconductor Manufacturing
Real-Time Gas Purity Monitoring for Ultra-High Purity Applications
Process Insights CQC Monitoring Solutions deliver continuous quality control for ultra-high purity (UHP) gas systems used in semiconductor manufacturing, specialty gas production, and critical industrial processes. Using advanced TIGER OPTICS™ technologies including Cavity Ring-Down Spectroscopy (CRDS) and Atmospheric Pressure Ionization Mass Spectrometry (APIMS), our systems continuously monitor trace impurities at parts-per-trillion (ppt) and ultra-trace detection levels.
Unlike periodic spot testing, continuous gas monitoring identifies contamination events in real time, helping manufacturers improve process control, protect product yield, reduce downtime, and maintain gas purity specifications. Existing positioning already emphasizes continuous monitoring and trace contamination control.
What is Cavity Ring Down Spectroscopy?
Technical Specifications of Tiger Optics CRDS
Cavity Ring-Down Spectroscopy: Principles, Applications, and Benefits
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TIGER OPTICS Cavity Ring-Down Spectroscopy (CRDS)
– Delivers excellent performance at a highly competitive price -
TIGER OPTICS Atmospheric Pressure Ion Mobility Spectrometry (APIMS)
– Offers the lowest detection limits available and covers the entire application range with a single analyzer
Detect Trace Gas Impurities Before They Impact Yield
Semiconductor and high-purity manufacturing environments depend on extremely clean gases. Even trace contamination can create wafer defects, product failures, and production interruptions. Continuous monitoring detects contaminants before they impact process performance. Semiconductor fabs can experience yield impact from trace contamination in bulk gas systems.
Monitor:
- Moisture (H₂O)
- Oxygen (O₂)
- Carbon Monoxide (CO)
- Carbon Dioxide (CO₂)
- Methane (CH₄)
- Ammonia (NH₃)
- Hydrogen impurities
- Multi-species contaminants
Applications for Continuous Quality Control Monitoring
Our CQC monitoring systems support:
- Semiconductor fabs
- Bulk gas delivery systems
- Specialty gas production
- Air Separation Units (ASU)
- Cylinder filling operations
- Electronic gas manufacturing
- Industrial gas quality assurance
- Pre- and post-purifier gas monitoring
Ultra-High Purity (UHP) Requirements
Semiconductor processes use ultra-pure gases and chemicals. Even trace levels of contamination—at parts-per-trillion (ppt) or lower—can cause defects, reduce yield, or damage expensive wafers. CQC monitoring solutions continuously check for impurities in process gases and environments, ensuring purity levels remain within spec.
Our CRDS CQC Solution
- Utilize CRDS for all bulk gases including O2
- Real-time measurement – Fast & continuous
- No calibration required – Low maintenance very few consumables
- Low cost of ownership – Very few consumables
- One GC for Ar and N2 limits helium use by >90%
Why Continuous CQC Monitoring Improves Process Performance
Benefits include:
- Real-time impurity detection
- ppt-level sensitivity
- Lower cost of ownership
- Reduced maintenance requirements
- No routine calibration for CRDS systems
- Faster contamination response
- Reduced helium usage
- Improved yield protection



SALES | TRAINING INQUIRIES
AMERICAS: info.americas@process-insights.com
EMEAI (includes India): info.emeai@process-insights.com
APAC: info.apac@process-insights.com
CHINA: info.cn@process-insights.com
Pre-Purifier
- Air Separation / N2 plant
- G-Gas
- Higher detection limits
- 5ppb-10ppb gas quality to the fab
POST-PURIFIER
- Lowest detection limits
- <1ppb gas quality inside the fab
- <.05ppb ambient air
- Purifier performance/breakthrough
- Bulk gas quality
- Specialty gas quality & blending
- Airborne Molecular Contamination
- Process tool monitoring
- Toxic gas monitoring
- Ultra-Pure Water (UPW)
- Wastewater discharge

CQC Monitoring Solutions (APIMS OPTION) LOWER DETECTION LIMITS (LDL)
- Utilize APIMS technology for CQC measurements in N2, Ar, H2 and He
- Real-time, multi-species monitoring for all critical impurities
- One APIMS per background gas or utilize stream-switching option
- Lowest LDL available – as low as 10 ppt
- Measurement range PPT to 100% concentrations
- Designed to minimize maintenance requirements
- User-friendly software and touchscreen interface
























































