HALO KA MAX H2O
Ultra-Trace Moisture Analyzer for High-Purity & Industrial Gases
HALO KA MAX H2O ppt-level moisture detection Ultra-Trace Moisture Analyzer for High-Purity & Industrial Gases
Unlike traditional moisture analyzers that rely on consumable sensors or frequent calibration, the HALO KA Max measures water vapor directly using laser-based CRDS technology. Built-in zero verification, exceptional sensitivity, and rapid response allow operators to detect contamination immediately, improve process control, and reduce maintenance while maintaining confidence in every measurement.
Key Features of the HALO KA Max H₂O UHP Gas Analyzer
- Ultra-sensitive detection of H₂O down to 100 ppt
- Optimized for UHP gases, including bulk, specialty, and semi bulk gas applications
- CRDS-based technology ensures precision, stability, and real-time performance
- Compact, all-in-one analyzer with a user-friendly interface
- Fast installation and effortless operation
- Built-in verification for simplified maintenance
- Ideal for semiconductor-grade gas quality control
Designed for High-Purity Gas Monitoring in Advanced Manufacturing
The HALO KA Max H₂O is built on our latest platform, combining speed, performance, and ease of use in a compact design. Whether you’re measuring moisture in nitrogen, hydrogen, argon, or complex gas mixtures, this UHP gas analyzer offers the accuracy and reliability required for process-critical environments.
MAXIMIZED LOW-DETECTION PERFORMANCE AND SPEED OF RESPONSE
- Parts per trillion (ppt) moisture detection capability in an array of gases
- Absolute measurement (freedom from calibration)
- Field proven lowest Cost of Ownership and ease of use
- Wide dynamic range—over four orders of magnitude
- Unprecedented speed of response at sub-ppb H2O levels
- Compact footprint (two Halo KA Max fit in a 19” rack)


SALES | TRAINING INQUIRIES
AMERICAS: info.americas@process-insights.com
EMEAI (includes India): info.emeai@process-insights.com
APAC: info.apac@process-insights.com
CHINA: info.cn@process-insights.com
applications
Semiconductor Manufacturing
Protect wafer yield by continuously monitoring trace moisture in ultra-high-purity process gases used throughout semiconductor fabrication.
Applications include:
- Bulk gas monitoring
- Specialty gas monitoring
- Gas cabinets
- Point-of-use monitoring
- Process tools
- Purifier verification
Hydrogen Production & Fuel Cells
Maintain hydrogen purity by detecting trace moisture during production, purification, compression, storage, and distribution.
Applications include:
- Hydrogen purification
- Pipeline monitoring
- Hydrogen fueling stations
- Fuel cell hydrogen quality
- Tube trailer loading
- Bulk hydrogen production
Industrial Gas Production
Continuously verify moisture specifications during industrial gas manufacturing and distribution.
Monitor:
- Nitrogen
- Oxygen
- Argon
- Helium
- Hydrogen
- Carbon dioxide
- Instrument air
Specialty Gas Manufacturing
Ensure moisture specifications before gases are certified and delivered to customers.
Applications include:
- Cylinder filling
- Specialty gas blending
- Electronic specialty gases
- Calibration gases
- High-purity gas certification
- Quality assurance laboratories
Air Separation Units (ASU)
Protect cryogenic equipment by detecting moisture before freeze-up occurs.
Applications include:
- Nitrogen production
- Oxygen production
- Argon recovery
- Cryogenic purification
- Product storage
- Distribution systems
Chemical & Petrochemical Processing
Prevent moisture from impacting catalyst performance, reaction efficiency, and product quality.
Typical measurements include:
- Feed gas monitoring
- Hydrogen recycle streams
- Catalyst protection
- Process gas quality
- Utility gas monitoring
- Dry gas systems
DETECTION CAPABILITY
| Detection and Matrix | Range | LDL* | Precision (1σ) @ zero |
|---|---|---|---|
| H2O in N2 | 0 – 5 ppm | 100 ppt | 40 ppt |
| H2O in He | 0 – 1 ppm | 100 ppt | 10 ppt |
| H2O in Ar | 0 – 2 ppm | 100 ppt | 20 ppt |
| H2O in H2 | 0 – 4 ppm | 100 ppt | 30 ppt |
| H2O in O2 | 0 – 2.5 ppm | 100 ppt | 20 ppt |
| H2O in Clean Dry Air (CDA) | 0 – 4 ppm | 100 ppt | 30 ppt |
SPECIFICATIONS
| Performance | |
|---|---|
| Operating range | See Detection Capability table |
| Detection Limit (LDL)* | See Detection Capability table |
| Precision (1σ, greater of) | ± 0.75% or 1/3 of LDL |
| Accuracy (greater of) | ± 4% or LDL |
| Speed of response | < 2 minutes to 95% |
| Environmental conditions | 10°C to 40°C, 30% to 80% RH (non-condensing) |
| Storage temperature | -10°C to 50°C |
| Gas Handling System and Conditions | |
| Gas connections | 1/4” male VCR inlet and outlet |
| Leak tested to | 1 x 10-9 mbar l / sec |
| Inlet pressure | 10 − 125 psig (1.7 − 9.6 bara) |
| Flow rate | ∼2 slpm in N2 (gas dependent) |
| Sample gases | See Detection Capability table |
| Gas temperature | Up to 60°C |
| Dimensions, H x W x D | |
| Standard sensor | 8.73″ x 8.57″ x 23.6″ (222 mm x 218 mm x 599 mm) |
| Sensor rack (fits up to two sensors) | 8.73″ x 19.0″ x 23.6″ (222 mm x 483 mm x 599 mm) |
| Weight | |
| Standard sensor | 28 lbs (12.7 kg) |
| Electrical and Interfaces | |
| Platform | Max series analyzer |
| Alarm indicators | 2 user programmable, 1 system fault, Form C relays |
| Power requirements | 90 − 240 VAC, 50/60 Hz |
| Power consumption | 40 Watts max. |
| Signal output | Isolated 4−20 mA |
| User interfaces | 5.7” LCD touchscreen, 10/100 Base-T Ethernet |
| USB, RS-232, RS-485, Modbus TCP (optional) | |
| Data storage | Internal or external flash drive |
| Certification | CE Mark |
| Patents | |
| U.S. Patent #7,277,177 | |
*The Detection limit (LDL) is defined as 3σ over 24h or the H2O drydown limit, whichever is higher

































