Content – 2023 Q3 High Purity News
|
|
|
|
Quality Control for Compressed Gas Cylinder Filling and Blending |
|
From pure argon for welding applications to xenon blends used to etch silicon microprocessors, the blends of high-quality gases are important raw materials and process gases for many industries. It is of utmost importance to processes that compressed gases meet high purity standards.
|
|
|
|
Get Your Analyzer Up and Running in Less Than Five Minutes! Watch the Video to Find Out! |
|
|
|
Trace-Level Hydrogen Analyzer – Leading Choice for Ultra-high Purity Gas Users
We are excited to introduce Process Insights’ new HALO H2 hydrogen analyzers. With two model ranges to choose from, you’re certain to find an LDL and background gases to meet your application. |
|
|
HALO H2 analyzer offers a fully laser-based solution for continuous quality control of your process. Using the HALO H2 hydrogen analyzer, you can verify H2 impurity levels with high accuracy, drift-free stability and fast response. You will find our system exceptionally easy and fast to install, and effortless to maintain, with built-in zero verification. Its robust design—free of moving parts—results in an analyzer that has a high Mean Time Between Failure (MTBF) rate and a very low Cost of Ownership (CoO).
|
View Brochure of Trace Hydrogen Analyzer with PPT to PPB LDL |
|
|
|
NEW Multi-Species Analyzer for Air Separation Units (ASUs), Truck Fill and Pre-Purification Applications |
Prismatic™ 3+, laser-based, multi-species trace gas analyzer, provides a versatile tool for process monitoring in critical applications, this compact, CRDS-based analyzer offers simultaneous detection of H2O, CO, CO2 and CH4, with ppb-level LDLs and an operating range into the upper ppm to ensure real-time, continuous protection of your process from harmful contaminants. |
|
|
The Prismatic 3+ features:
Simultaneous ppb level detection of CO, CO2, H2O and CH4
Ideal analyzer for monitoring gas purity in ASUs, truck fill and pre-purification in Semi
Powerful CRDS laser-based technology
Low Cost of Ownership: no calibration or utility gas requirements
Perfect for unmanned operations due to ease of use
|
View Brochure of the Prismatic 3+ Multi-Species Analyzer for ASUs and more |
|
|
|
Thank You For Visiting Our Booth at Semicon West 2023! |
|
Thank you for visiting the Process Insights booth at SEMICON West 2023! We showcased innovative new products to address the challenges of advanced semiconductor fabrication, providing total solution for online analysis of bulk and specialty gas, as well as ultra-pure water.
|
At the Moscone Center, we unveiled our analytical instrument including:
- Laser-based, mid-infrared QCL technology, ppt-level detection of CO and CO2in UHP bulk gases: HALO Max QCL series
- Ultra fast, laser-based CRDS, ppt-level detection of Airborne Molecular Contaminants (AMCs): T-I Max series
- Atmospheric Pressure Ionization Mass Spectrometer (APIMS) ppt-level detection limits for contamination control in Ultra-High Purity (UHP) gases: VeraSpec APIMS
- High performance dew point chilled mirror analyzer: Model 473
- Online TOC measurement of ultra-pure water: QuickTOCtrace
|
|
Our High Purity Team achieved remarkable success at Semicon West, hosted at the prestigious Moscone Center in San Francisco. This event served as an excellent opportunity for us to strengthen connections with our contacts, customers, and partners, while propelling our business to new heights.
Among the distinguished attendees were Erika Coyne, Jim Belanger, Alex Lowe, Douglas Barth, John Dunleavy, Brian Hogan, Greg Thier, and Terri Melle-Johnson, who contributed to the event’s success.
The highlight of the first day was our customer cocktail reception held on the 46th Floor of the Hilton CityScapes. The turnout was phenomenal, and the breathtaking view from the venue added to the excitement of the evening. It was truly a memorable gathering that fostered meaningful interactions and reinforced our commitment to delivering excellence in our industry.
We look forward to meeting you at future events! |
|
|
|
|
|
|